W／Mo纳米多层膜的界面结构与超硬效应

A Study on the Interface Microstructure and Superhardness Effect of W/Mo Multilayer

摘要:

研究了W/Mo纳米多层膜的微结构及超硬效应，W/Mo纳米多层膜采用磁控溅射技术制备，并采用XRD、TEM和显微硬度计研究了薄膜的微结构和硬度。结果表明，W/Mo纳米多层膜形成多晶外延生长的超晶格结构，界面共格畸变使W/Mo两调制层的晶面间距随调制周期的减小而相互接近，在多层膜中形成交变应力场，从而使薄膜得到强化。

Abstract:

The interface microstructure and su perhardness effect of W/Mo nano -mul tilayers have been studied.The W/Mo multilayers were synthesized with magnetron sputtering technique and their microstructure and hardness were characterized by XRD,TEM,HREM,and mi-croindenter,respectively.The results show that the W/Mo multilayers h ave a epitaxially grown mode and got polycrystal superlattices.With the decrease of modulation period of multilayers,the interplanar dista nces of Wand Mo layers are close to eac h other resulting from coherent strain on the interface,which produces an alternating stress field and s trengthens multilayers.