纳米ITO粉末及高密度ITO靶制备工艺的研究现状

Technological Development of Preparing Nanosized ITO Powder and Ultra High Density ITO Target

摘要:

对铟锡氧化物ITO(Indium Tin Oxide)纳米粉末的制备方法如均相共沉淀法，水溶液共沉淀法，电解法，溶胶-凝胶法，喷雾燃烧法，喷雾热分解法等以及ITO磁控溅射靶的现有几种制备工艺进行了综合评述。阐述了各种制备工艺过程和工作原理，比较和分析了各工艺方法的优缺点，并提出了制备高品质ITO粉末及ITO靶的努力方向。

Abstract:

Technological methods of preparing indium tin oxide(ITO) powder and ITO sputtering target are summarized and some remark on them are made in this paper. The various preparing procedures and the principles of the technology methods are recommend and analyzed. Relative merits of these methods are investigated, furthermore, ideas of improvement on preparing good quality ITO powder and the target are proposed.