U上Al，Ti／Al镀层研究

Study on Al, Ti/Al Bilayers Coatings on Uranium Substrates

摘要:

用循环Ar^ 轰击-磁控溅射离子镀（MSIP）法在U表面上镀Al,Ti/Al,并采用俄歇电子能谱仪（AES）、扫描电镜（SEM）、电化学实验和平面磨耗实验，研究了其表面、剖面形貌和耐磨耐蚀性能，以及Al/U和Ti/Al镀层界面。结果表明：U上循环Ar^ 轰击-磁控溅射离子度Al,Ti/Al界面存在较宽的原子共混区，且Ti/Al镀层的耐磨蚀性能明显优于单一磁控溅射离子镀Al层。

Abstract:

Al, Ti/Al coatings on U substrates were prepared by repeated Ar+ bombardment-magnetron sputter ion plated (MSIP). The surface morphology, cross-sectional morphology, interfaces, wear-resistance, and corrosion resistance have been investigated by Auger electron spectroscopy (AES), scanning electron microscopy(SEM), electrochemical test, and wearing test respectively. The results showed that the surface morphology of Al, Ti/Al coatings were constituted of fine grains with smooth appearance. The more wide co-existence Interface of coatings and substrates were prepared by repeated Ar+ bombardment-magnetron sputter ion plated (MSIP). The degree of protection of Uranium against corrosion and wear-resistance plated of Ti/Al coatings by repeated Ar+ bombardment-MSIP is superior to that of sole Al coatings.