氨气和氮气气氛下热处理对ITO薄膜光电性能的影响

Influence of Heat Treatment in Different Atmospheres upon Optical and Electrical Properties of ITO Films

摘要:

利用射频磁控溅射在室温玻璃衬底上制备了氧化铟锡（ITO）薄膜，并分别在氨气、氮气和空气气氛下对薄膜进行了热处理。利用X射线衍射、霍尔效应、UV-VIS-NIR分光光度计等测试手段对薄膜样品进行表征，研究了不同热处理气氛及温度对ITO薄膜光电特性的影响。结果发现在不同气氛下热处理均能明显提高ITO薄膜在可见光区的透过率，氨气气氛下更有利于薄膜导电特性的改善。

Abstract:

ITO films were prepared by r.f. magnetron sputtering, and were annealed in ammonia, nitrogen and air atmosphere respectively. The annealing effects on electrical and optical properties of ITO films under different atmospheres were studied using X-ray diffraction (XRD), Hall Effect and UV-VIS-NIR spectrometer. The transmission of ITO films is greatly improved by the heat treatments in all atmospheres. The electrical properties of ITO films annealed in ammonia are better than in other two atmospheres.