镀铂栅极抑制电子发射性能研究

Electron Emission Suppression Characteristic of Molybdenum Grid Coated with Pt Film by Ion Beam Assisted Deposition

摘要:

利用离子束辅助沉积（IBAD）方法在Mo栅极表面上沉积Pt膜，采用试验二极管方法测量和比较阴极活性物质Ba，BaO蒸发到镀铂栅极和纯钼栅极表面上后的电子发射性能。采用XRD，EDX，XPS等测试手段对其栅极表面进行对比分析和表征。实验结果表明：镀铂栅极具有明显的抑制电子发射性能，并初步探讨了离子束辅助沉积Pt膜抑制栅电子发射的机理。

Abstract:

Platinum was deposited onto molybdenum grid by ion beam assisted deposition (IBAD). Electron emission behavior from molybdenum grids with and without Platinum contaminated by active electron emission substances (Ba, BaO) of the cathode were measured using analogous diode method. The characteristics on molybdenum grid coated with platinum film were analyzed by X-ray diffraction (XRD), energy dispersive X-ray (EDX) and X-ray photoelectron spectroscopy (XPS). The results show that the electron emission from the grid coated with platinum film is less than that without Platinum film, and the mechanism for suppression of the electron emission of molybdenum grid coated with Platinum film was discussed.