TG146.4
国家高技术研究发展计划(863计划)项目(2002AA305306)
华云峰,陈照峰,张立同,成来飞. MOCVD Ir薄膜的制备与沉积效果分析[J].稀有金属材料与工程,2005,34(1):139~142.[Hua Yunfeng, Chen Zhaofeng, Zhang Litong, Cheng Laifei. Preparation of Iridium Films by MOCVD and Deposition Effectiveness Analysis[J]. Rare Metal Materials and Engineering,2005,34(1):139~142.]
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