磁控溅射氧化钒薄膜的相成分及电阻-温度特性

Phase Compositions and Resistance-Temperature Characteristic of VOx Thin Films by Magnetron Sputtering

摘要:

采用磁控溅射法在p-Si(100)衬底上制备了VOx薄膜。利用X射线衍射(XRD)分析、原子力显微镜(AFM)及四探针测试方法，研究了制备工艺条件对薄膜的相成分和电阻．温度特性的影响，并测试分析了薄膜的电学热稳定性。结果表明：通过这种方法制备的氧化钒薄膜具有较高的电阻温度系数及良好的电学热稳定性，可作为微测辐射热计的热敏材料。

Abstract:

Thin VOx films were prepared by magnetron sputtering onto p-Si(100) substrates. X-ray diffraction (XRD), atomic force microscope(AFM) and four-point probe method were employed to study the influence of the preparation parameters on the phase composition and resistance-temperature characteristic of VOx. The thermal stability of the films was also investigated. The results show that VOx films prepared by this method have relatively high temperature coefficient of resistance (TCR) and perfect thermal stability. They are promising to be used as thermal sensor materials in the microbolometer.