热处理对TiO_2溅射薄膜结构和光谱性能的影响

The Effect of the d-Electron Transition on UV-Vis Spectra and PL Spectra of TiO_2 Films

摘要:

用直流反应磁控溅射法制备了TiO2薄膜,并对热处理前后试样的紫外可见光谱(UV-Visspectrum)和荧光发射光谱(PLSpectrunm)做了研究。发现热处理后试样的紫外可见光谱在496nm处出现了一个较为明显的吸收峰,荧光发射光谱496.5nm处出现一个荧光发射带肩。X射线光电子能谱(XPS)的分析结果表明,热处理可使薄膜中晶格氧扩散出去,生成Ti3+离子和氧空位。结合XPS的分析结果和理论计算,可推断热处理后出现的位于496nm处的吸收峰和496.5nm处的荧光带肩可被指认为薄膜中Ti3+离子的d电子跃迁产生。

Abstract:

TiO2 films were prepared by dc reactive magnetron sputtering. The UV-Vis spectra and PL spectra of samples before and after heat treatment were studied in detail. An absorption peak (496 nm) in UV-Vis spectra and an emission shoulder (496.5 nm) in PL spectra are observed clearly. The analysis of X-ray photoelectron spectroscopy (XPS) indicates that the lattice oxygen can be removed by heat treatment to form the Ti3+ and oxygen vacancies. Taking the XPS analysis and theory calculation into consideration together, it can be concluded that the absorption peak (496 nm) in UV-Vis spectra and the emission shoulder (496.5 nm) in PL spectra are attributed to the d-electron transition of Ti3+ in TiO2 films.