阴极弧径向不同位置膜层性能分布规律

Uniformity of Thickness and Surface Properties of TiN Films Deposited by Vacuum Arc

摘要:

利用阴极弧沉积的方法在201不锈钢基体上制备了TiN薄膜，研究了阴极弧径向不同位置大颗粒、膜厚以及膜层性能的分布规律。分别采用X射线衍射(XRD)和扫描电子显微镜(SEM)分析了膜层的相结构、膜层的表面形貌和截面形貌。研究了镀膜试样和基体在3.5%(质量分数)NaCl溶液中的腐蚀行为，并利用电化学方法分析其抗腐蚀性能，并采用球-盘式摩擦磨损、划痕测试以及微小压痕等方法测试了径向不同位置沉积的TiN薄膜摩擦磨损性能、膜基结合力以及硬度。结果表明，靠近靶材中心的位置，膜层的硬度、厚度最大，电化学腐蚀电位最高，

Abstract:

During vacuum arc deposition processes, non-uniformity of thickness and surface properties of deposited films may be induced due to the line-of-sight of vacuum arc plasma. In this paper TiN films were deposited on AISI201 stainless steel horizontally located in front of the arc source and the uniformity of macroparticle, film thickness and surface properties is focused on. The phase structure, surface morphology and corrosion-resistance were analysized by XRD, SEM and electrochemical method. The frictional behavior of uncoated and coated stainless steel was evaluated by pin-on-disk tribometer. The scratch test and micro indentor were utilized to determine the adhesion and hardness of TiN films. The experimental results have demonstrated that TiN film deposited at center site possesses maximal hardness，highest corrosion-resistance and largest thickness. In contrast the TiN films at angle of 20o display minimal thickness and hardness. There are more macroparticles on films deposited at positive angles leading to weak corrosion-resistance. This may be attributed to the force of gas flow induced by pumping system. The friction coefficient and adhesion of TiN films at central site are larger compared to those at other sites.