Ga+离子辐照对CoFe铁磁膜结构和磁性的影响

Influence of Ga+ Irradiation on Microstructure and Magnetic Properties of CoFe Film

摘要:

利用磁控溅射法制备Substrate/Seed Ta (5 nm)/Co75Fe25(5 nm)/Cap Ta(8 nm)铁磁膜，通过透射电镜(TEM)、选区电子衍射(SAED)和X射线衍射(XRD)等分析测试手段，研究Ga+离子辐照对CoFe磁性薄膜的矫顽力及薄膜的组织、结构的影响，利用SRIM2003软件模拟分析离子辐照后Ga、Ta等元素在CoFe薄膜中的深度分布情况。研究结果表明：采用低剂量(<1×1013ion·cm-2)的Ga+离子辐照对薄膜的矫顽力和磁性薄膜的组织、结构影响不大；随着辐照剂量的

Abstract:

The CoFe ferromagnetic film with substrate/seed Ta (5 nm)/Co75Fe25 (5 nm)/Cap Ta (8 nm) was prepared by using UHV magnetron sputtering. The Influence of Ga+ irradiation on the microstructure and the magnetic properties of CoFe film were investigated by means of transmission electron microscope (TEM), selected electronic diffraction (SAED) and X-ray diffraction (XRD). The concentration profiles for Ga, Ta in the film after irradiation were also simulated by SRIM2003. The results show that the coercivity and microstructure of the film vary slightly after irradiation at low dose (less than 1×1013 ion·cm-2). With increasing of Ga+ ion dose, the coercivity decreases, the grain grows and the degree of <111> texture weakens. At high dose with 1×1015 ion·cm-2, noncrystalline appears in the CoFe film due to the presence of large atoms such as Ta and Ga and the existence of large amount of vacancies resulting in the film non-magnetizaton