强流脉冲离子束辐照对DZ4合金微观结构的影响

Effect of High Intensity Pulsed Ion Beam Irradiation on Microstructure of Refractory Alloy DZ4

摘要:

利用成分为Cn+（30 mol%）和H+（70 mol%），加速电压为250 kV，脉冲宽度为70 ns，束流密度为100 A/cm2的强流脉冲离子束(high intensity pulsed ion beam-HIPIB)辐照DZ4镍基高温合金，辐照次数分别为5、10和15次。利用透射电子显微镜（TEM）分析辐照前后合金表层微观结构的变化。结果显示，与原始样品比较，辐照不同次数后的样品最表面都产生了一层晶粒度为5~10 nm的多晶层，它是由DZ4合金中各元素的单质相组成的。在距表面一定深度范围内，不存

Abstract:

Surface irradiation for refractory Ni-based alloy DZ4 was realized by high intensity pulsed ion beam (HIPIB) containing Cn+ (30 mol%) and H+ (70 mol%), with pulse duration of 70 ns and current density of 100 A/cm2, under the accelerating voltage of 250 kV; while the treating pulses were chosen as 5, 10 and 15 times. The surface microstructure changes before and after irradiation was analyzed by TEM. Results show that compared with the original sample, a polycrystal layer appeared on the topmost surface of the sample, no matter what times it was irradiated; the layer was composed of Ni, Cr, Al, Ti, W, Mo and Co elemental crystal with grain size of 5~10 nm. g ￠ phase did not exist below the polycrystal layer in certain depth, but its content increased gradually as the depth increasing.