基板温度对EB-PVD ZrO2涂层微观组织及残余应力的影响

Effect of Substrate Temperature on Microstructure and Residual Stress of EB-PVD ZrO2 Coating

摘要:

采用电子束物理气相沉积(EB-PVD)技术在不锈钢基板上沉积ZrO2涂层。研究基板温度对涂层微观组织和残余应力的影响。结果表明：沉积的涂层均为t-ZrO2结构，涂层表面平整致密；随着基板温度的升高，涂层表面颗粒逐渐长大，表面粗糙度增大；涂层残余应力也随着基板温度的升高而增加，当基板温度为1000 ℃时，涂层残余应力的增量最大，ZrO2涂层的残余应力主要是由于涂层与基板热膨胀系数差别而产生的热应力引起

Abstract:

ZrO2 thin coatings were deposited on stainless steel substrates by electron beam physical vapor deposition (EB-PVD) under different substrate temperatures. The phase composition, microstructure and residual stress of the deposited coatings were investigated by grazing incidence X-ray diffraction, scanning electron microscopy and atomic force microscope techniques. The results show that all the deposited thin films have a tetragonal structure with a preferred orientation (111). The grain size, surface roughness and residual stress of the ZrO2 coatings increase as the substrate temperature goes up. The residual stress of ZrO2 coatings was induced by the thermal stress due to the difference of thermal expansion coefficients of ZrO2 ceramic coatings and metal substrate