TiNi/ZnO复合智能薄膜的制备及性能研究

Research on Preparation and Properties of TiNi/ZnO Intelligent Thin Films

摘要:

使用射频磁控溅射法在石英衬底上制备quartz/ZnO/TiNi及quartz/TiNi/ZnO复合薄膜结构，利用XRD、SEM划痕仪等测试方法研究了复合薄膜的相结构、微观组织、力学性能。利用DMA分别研究了quartz/TiNi与quartz/ZnO/TiNi复合结构的阻尼性能随振动频率及振幅的变化规律。结果表明，前者频率响应范围在10 Hz以内，后者响应范围达到20 Hz；前者的临界外加激振电压仅为0.6 V，后者的临界外加激振电压达到1.0 V。阻尼性能测试表明，quartz/ZnO/TiNi复合结构的阻尼性能优于quartz/TiNi复合结构。由划痕仪测得两种复合薄膜结构与基体的临界结合力分别为45.75和40.15 N

Abstract:

Quartz/ZnO/TiNi and quartz/TiNi/ZnO multilayer films were prepared by RF magnetron sputtering process on the quartz substrate. The phase composition, microstructure and mechanical properties of the multilayer films were investigated by XRD, SEM and scratch test methods, respectively. The change rule of the damping capability with the frequency and amplitude was investigated by DMA for quartz/TiNi and quartz/ZnO/TiNi multilayer films. Results show that the frequency response of quartz/TiNi is within 10 Hz, while that of quartz/ZnO/TiNi almost reaches to 20 Hz. The damping amplitude of quartz/ZnO/TiNi is 1.0 V, while that of quartz/TiNi is only 0.6 V. The damping capability of quartz/ZnO/TiNi is superior to that of quartz/TiNi. The critical adhesion forces between the multilayer thin film and quartz substrate for quartz/ZnO/TiNi and quartz/TiNi are 45.75 N and 40.15 N, respectively