热处理工艺对Ni-7W合金基带立方织构的影响

Influences of the Heat Treatment Process on Cube Texture of SPS Ni-7at%W Alloy Substrates

摘要:

采用先进的放电等离子烧结技术(SPS)制备Ni-7W(at%, 下同)(Ni7W)合金初始锭，通过高能球磨使Ni、W粉末充分混合，优化冷轧和热处理工艺制备出高立方织构的Ni7W合金基带。基带晶粒大小均匀，电子背散射衍射技术(EBSD)测试结果显示：该Ni7W基带表面10°以内立方织构晶粒含量高达99.4%，10°以内晶界长度含量为93.6%；XRD测得的基带(111)Phi扫描和(200)摇摆曲线表明：基带的面内和面外半高宽分别是6.32°和5.4°，表明基带具有锐利的立方织构。在该基带上制备的La2Zr2O7(LZO)过渡层显示，LZO很好地外延生长了基底的织构，LZO薄膜(222)面φ扫描和(400)面摇摆曲线的半高宽值分别为7.57o°和5.73°

Abstract:

The cube textured Ni-7at%W(Ni7W) substrates were prepared starting from spark plasma sintered ingot, followed by Rolling-Assisted Biaxially Textured Substrate (RABiTS) processing. According to the EBSD and XRD analyses of the fully annealed tape, the cube grain content of the tape reaches as high as 99.4% within a tolerance angle of less than 10o and the grain boundary length content is 93.6% within a tolerance angle of less than 10o, while the FWHM values of the in-plane and out-of-plane orientations are about 6.32o by (111) Phi-scan and 5.4o by (200) ω-scan, respectively, indicating that the tapes have sharp cube texture. The Ni7W substrate has a uniform grain size and high quality of cube texture. The La2Zr2O7 (LZO) buffer layer fabricated on Ni7W substrates shows that the epitaxially textured LZO buffer layer could be formed on the as-obtained Ni7W substrate. The FWHM values of (222) φ-scan and (400) ω-scan are 7.57° and 5.73°, respectively