磁控溅射Zr-Ti薄膜的组织结构与血液相容性

Microstructure and Blood Compatibility of Zr-Ti Film Depositedby Magnetron Sputtering

摘要:

通过直流平衡磁控溅射法在NiTi SMA表面生成Zr-Ti膜，用SEM、XRD和XPS分析证实制备的Zr-Ti膜呈现晶带T型结构，组织保持了细小致密的纤维状特征，与基底结合良好，并且出现了少量生物惰性ZrO2和TiO2陶瓷相。通过测定溶血率研究血小板黏附行为，评估血液相容性。结果表明，与NiTi基底相比，Zr-Ti膜的溶血率更低，表面黏附的血小板数量减少，能够改善NiTi SMA基底的血液相容性。最后，对磁控溅射沉积Zr-Ti膜的成膜机理进行了探讨

Abstract:

Zr-Ti film was deposited on the surface of NiTi shape memory alloy (SMA) by balanced magnetron DC sputtering. The results of SEM, XRD and XPS indicate that the Zr-Ti film has the T-type crystal band structure with a fine and dense fibre character. The film has a good combination with NiTi substrate and a small amount of bioinert ZrO2 and TiO2 ceramics phases is found in the film. Blood compatibility was evaluated by hemolysis test and platelet adhesion test. The hemolysis of Zr-Ti film is less than that of NiTi SMA. And the number of platelets on the sample surface is also less than that of Zr-Ti film, which indicates the blood compatibility of NiTi SMA could be improved by the Zr-Ti film. Finally the depositing mechanism of the Zr-Ti film by magnetron sputtering was discussed