TiO2纳米孔结构的XPS研究

XPS Study on Nanoporpous Structured TiO2

摘要:

采用表面机械研磨处理技术 (Surface mechanical attrition treatment，SMAT)在工业纯Ti的表面制备出一层厚度约30 mm纳米结构表层，最表层的平均晶粒尺寸约30 nm。随后在常温(25 ℃)下对其进行双氧水及400 ℃煅烧处理，并采用X射线光电子能谱(XPS)等手段进行了逐层结构分析。结果表明，SMAT Ti表面与粗晶Ti表层形成的氧化层结构存在明显差别

Abstract:

A naocrystalline layer (thickness of about 30 μm) was prepared by surface mechanical attrition treatment (SMAT) on commercial pure Ti, and the mean grain size on top-surface was about 30 nm. The SMAT Ti was then treated by immersing in H2O2 solution at 25 oC followed by calcination at 400 °C for 1 h. XPS was used to analyze the SMAT Ti structure layer by layer. The results show that obvious differences of the oxidation layer structure exist between SMAT Ti and CG (coarse grain) counterpart