纳米晶体Ti表面磁控溅射SiC薄膜的干摩擦学性能

Dry Tribological Properties of Magnetron Sputtered SiC Films on Nanocrystalline Titanium Substrate

摘要:

采用室温磁控溅射技术在纳米晶体钛（剧烈塑性变形制备）表面制备出碳化硅（SiC）薄膜，研究SiC薄膜的组织结构、纳米压痕行为和摩擦磨损性能。结果表明：SiC薄膜具有纳米尺度“畴”特征的表面形貌、高含量Si-C键、与基材间具有明显且呈梯度的元素扩散、低的纳米硬度（10.62 GPa）、低的弹性模量（83.34 GPa）和高的硬模比（0.128）。在1.96 N载荷、氮化硅球（半径为2 mm）为对摩件、室温空气条件下，其磨损速率为10-5?mm3·m-1·N-1级、摩擦系数约为0.162，磨损后薄膜不出现裂纹和剥落。

Abstract:

SiC (carbon nitride) thin films were deposited on nanocrystalline titanium substrate (produced by severe plastic deformation) by magnetron sputtering technique at room temperature. The microstructure, nano-indentation and friction/wear properties of the SiC films were investigated. The results show that the SiC films are of nano-scale domain features for surface morphology, a large amount of Si-C bonds, good adhesion (with obvious and gradual film-substrate element diffusions as well as small film-substrate elastic modulus difference), low nano-hardness (10.62 GPa), low Young's modulus (83.34 GPa) and high hardness-to-modulus ratio (0.128). When sliding against Si3N4 ball (2 mm in radius) under room-temperature air condition and 1.96 N load, the SiC films exhibit the friction coefficient of about 0.162, and the special wear rate in the magnitude order of 10-5 mm3·m-1·N-1 with no film cracking and interface delaminating.