Synthesis of TbCu7-type Structural SmCo-based Films for Microelectromechanical System Applications

摘要:

微机电系统 (MEMS) 的发展要求Si基片上的永磁薄膜具有良好的热稳定性。采用磁控溅射工艺在单晶Si (100) 基片上沉积了SmCo基永磁薄膜，研究了溅射参数对薄膜沉积速率、微观结构、晶体结构和磁性能的影响。结果表明：通过调整溅射参数可以获得TbCu7型结构的SmCo基永磁薄膜。该薄膜具有良好的晶粒取向和微观结构，因而获得了较好的面内磁性能，其反磁化过程主要受控于畴壁钉扎机制

Abstract:

Development of microelectromechanical system (MEMS) requires permanent magnetic films prepared on Si substrates with good thermal stability. The SmCo-based films were deposited on Si (100) substrates by magnetron sputtering process, and the effect of sputtering parameters on deposition rate, microstructure, crystal structure, and magnetic properties were investigated subsequently. The results show that the TbCu7-type structural SmCo-based film is obtained with adjusted sputtering parameters. The film exhibits a well preferred crystal orientation and fine microstructure, leading to better in-plane magnetic properties and a magnetization reversal process mainly controlled by domain wall pinning mechanism.