N2流量对室温磁控溅射制备Ti-N薄膜太阳能光谱吸收特性的影响

Influence of Nitrogen Flow Rate on the Solar Spectrum Absorbing Properties of Titanium Nitride Films Prepared by Magnetron Sputtering

摘要:

利用非平衡磁控溅射技术，在室温条件下制备了一系列不同N2流量的Ti-N薄膜，研究了N2流量对薄膜微观形貌和光学性能的影响。根据分析结果设计并制备了四层结构的Ti-N太阳能选择性吸收薄膜，通过软件对薄膜进行了优化设计并进行了实验验证。结果表明, 随着N2流量的增加, 薄膜的微观形貌发生变化，逐渐出现气泡状沉积物及气泡破裂状形貌，直至变为无定型态。通过紫外-可见-近红外光谱分析可知，选用合适的工艺可有效提高太阳能吸收薄膜光学性能，利用软件对薄膜进行优化设计可使薄膜光学性能获得进一步改进，经过优化的薄膜吸收率达0.9048，可用作太阳能光谱选择性吸收薄膜

Abstract:

Titanium nitride (Ti-N) thin films were deposited by unbalanced magnetron sputtering under conditions of various N2 flow rates at room temperature. The morphologies and optical properties of the films were studied. Four layers of solar selective absorbing coatings based on Ti-N were designed and then optimized by optical design software of SCOUT. Results show that various characteristics such as bubble precipitates, bubble bursting, and amorphous morphologies are observed in the films with the increasing of N2 flow rate. The UV-Visible-NIF spectra show that the optical properties of the films can be improved using appropriate sputtering parameters and software optimization. Absorptance of the optimized films is enhanced from 0.8209 to 0.9048 after optimization, which are suitable as solar selective absorbing coatings