磁控溅射Pd膜对Zr70Fe5.4V24.6合金吸/放氢性能的影响

Influence of Magnetron Sputtering Pd on Hydrogen Absorption/Desorption Properties of Zr70Fe5.4V24.6 Alloy

摘要:

采用磁控溅射技术在Zr70Fe5.4V24.6 (质量分数, %, 下同)合金基体上沉积Pd膜。研究磁控溅射沉积Pd膜的生长特性和显微组织及Pd膜对Zr70Fe5.4V24.6合金吸/放氢性能的影响规律。结果发现，在Zr70Fe5.4V24.6合金基体上磁控溅射沉积的Pd膜具有fcc结构并在（111）晶面有明显的择优取向。对镀膜后合金吸/放氢性能的测试结果表明，磁控溅射沉积Pd膜对Zr70Fe5.4V24.6合金的活化性能及吸氢动力学无显著影响。沉积Pd膜后Zr70Fe5.4V24.6合金可逆吸氢量H/A由0.63增至1.20，吸氢平台增长量约为90%。氢化物形成焓绝对值的平均值增大约77%，生成熵的平均值增大约56%，沉积Pd膜后的合金与氢结合所形成的氢化物更稳定。

Abstract:

Pd thin film was deposited by radio frequency magnetron sputtering on the Zr70Fe5.4V24.6 (wt%) alloy substrate. The growth characteristics and microstructure of the Pd membrane were researched. The influence of Pd on the hydrogen absorption/desorption properties of Zr70Fe5.4V24.6 alloy was also investigated. The results indicate that the sputter deposited Pd film of fcc structure grows with the (111) preferred orientation. The results of hydrogen absorption/desorption properties test show that Pd film has no significant effect on activation properties of Zr70Fe5.4V24.6 alloy, as well as hydriding kinetics. The length of plateau area of P-C-T curves increases by about 90% after Pd membrane deposition; meanwhile, the reversible hydrogen storage capacity H/A increases from 0.63 to 1.20. After Pd film deposition, the absolute value of hydride formation enthalpy and the average value of formation entropy increase by 77% and 56%, respectively, indicating the formation of the more stable hydride.