成分配比对Ti/IrO2-Ta2O5电极电容性能影响

Influence of composition on the structure and capacitive performance of Ti/IrO2-Ta2O5 electrodes

摘要:

摘要：采用低温热分解法制备了Ti基IrO2-Ta2O5氧化物涂层电极。通过X射线衍射(XRD)，循环伏安曲线，交流阻抗谱，恒流充放电等测试方法分析了Ta含量对IrO2-Ta2O5氧化物涂层组织结构及电容性能的影响。结果表明，Ta2O5可抑制IrO2的晶化程度。随涂层中Ta含量增加，晶化度降低。当Ta含量为60mol%时，IrO2-Ta2O5电极的结晶度为6.4%，具有较小的电荷转移电阻和最高的比电容（239.2F/g），比IrO2电极比电容(54.1F/g)提高了近4倍。

Abstract:

Abstract: Ti/IrO2-Ta2O5 electrodes were prepared by low thermal decomposition method. The influence of Ta contents on the microstructure and capacitive performance of the Ti/IrO2-Ta2O5 electrodes was investigated by XRD, cyclic voltammetry,electrochemical impedance spectroscopy and galvanostatic charge-discharge tests. The results showed that Ta2O5 can inhibit crystallization of the IrO2.With increasing Ta contents, the crystallization degree decreased.When the content of Ta increased to 60%mol, the electrode with a content of 6.4% crystalline structure had a superior capacitive performanceof 239.2 g/F,which was considerably higher than that of IrO2 electrode(54.1 g/F) .