C含量对电弧离子镀TiAlCxN1-x(x=0, 0.18, 0.41, 0.49, 0.69)薄膜性能的影响

Effect of C Content on Properties of TiAlCxN1-x (x=0, 0.18, 0.41, 0.49, 0.69) Films Deposited by Arc Ion Plating

摘要:

在GCr15轴承钢基体上, 利用多弧离子镀技术低温（175 ℃）沉积TiAlCN涂层。利用SEM、EPMA、XRD、附着力测试仪、纳米压痕仪和UMT-2 高温摩擦磨损测试仪研究薄膜性质。结果表明，涂层表面光滑平整、均匀致密且无明显孔洞。涂层表面存在一定数量的液滴颗粒，薄膜厚度约为2 μm。在涂层中，发现了晶体结构为fcc-TiN结构，薄膜的晶粒大小为10~30 nm；随着薄膜中C元素的加入，XRD谱中(Ti0.5,Al0.5)N峰出现了宽化；在TiAlN中引入C，附着力下降，随着涂层中C含量的增加，薄膜中的Al和Ti比例未发生明显变化，附着力略微增加，但硬度和弹性模量先增加后减小，摩擦系数一直减小

Abstract:

The composite TiAlCN films were deposited by vacuum arc ion plating on GCr15 rings at 175 oC. The properties of the films were characterized by SEM,?EPMA,?XRD,?adhesion?tester,?nano-hardness?tester and UMT-2 high temperature tribometer. The results indicate that the surface of the films is smooth and dense without any obvious pores. There are a certain number of droplets on the surface of films. The thickness of the films is about 2 μm. The fcc structure of TiN is found in the films. The grain size of the films is from 10 to 30 nm. With the addition of C element into the film, (Ti0.5,Al0.5)N peak in XRD patterns appears in width. After adding C into TiAlN, the adhesion of the films declines. However, the adhesion increases slightly along with the increase of the C content, but Al and Ti ratio does not change significantly. Besides, the hardness and elastic modulus increase first and then decreases, and the friction coefficient is always declined