NbF5前驱体化学气相沉积铌涂层的生长动力学

Growth kinetics of niobium coating prepared by CVD from NbF5

摘要:

采用常压化学气相沉积方法在1150℃下成功制备了组织致密的金属铌涂层,沉积速率达到了250μm/h。通过对沉积后沿进气方向涂层厚度分析,确定了不同位置NbF₅、H₂、HF及Ar的摩尔百分比,对数据进行拟合获得了与实验结果吻合较好生长动力学方程。进一步分析动力学方程可知副产物HF对于沉积速率影响较大而Ar几乎没有影响。

Abstract:

_{:Dense niobium coating was successfully prepared by atmospheric pressure chemical vapor deposition(CVD) method at 1150℃ ,which reached 250μm / h deposition rate. Analysis the post-deposition coating thickness by the gas flow direction,the mole percentage of NbF5, H2, HF and Arin different positionsweredetermined. And got agrowthkinetics equation which agrees well with the experimental results . Further analysis of the kinetic equations showed that the byproduct HF has a greater impact on deposition rate and Ar almost no effect.}