碳酰胺与氢化锆高温下原位反应层的AES/XPS分析

Investigation of Coatings Formed by Reaction Urea and Zirconium Hydride at High Temperature by AES and XPS Technique

摘要:

本文采用碳酰胺高温分解产生含C、O、N源与氢化锆原位反应制备阻氢渗透层,借助俄歇电子能谱(AES)和X射线光电子能谱(XPS)等手段对阻氢渗透层元素成分及深度、键态进行分析。俄歇电子能谱(AES)结果表明：氢化锆表面原位反应层由C、N、O、Zr元素组成,随溅射时间增加,O、Zr元素含量增加,C、N元素含量降低。原位反应层厚度约3.4μm,其中含N、C层深度约150nm左右。氢化锆表面阻氢渗透层XPS分析表明,表面层存在ZrO₂,同时有Zr-OH、Zr-N、C-H、N-H键。碳酰胺与氢化锆高温下原位反应层渗透的机理是基体中H扩散时被C、O、N捕捉形成相应的C-H、O-H、N-H键。

Abstract:

Hydrogen anti-permeation coatings were formed by chemical reaction using urea and zirconium hydride at a high temperature range. The composition and depth of elements, bond state were analyzed by auger electron spectroscopy(AES) and X-ray photoelectron spectroscopy(XPS) technique. The results indicate that the thickness of coating, which is mainly composed of carbon, nitrogen, oxygen and zirconium, is 3.4μm, of which including nitrogen and carbon the thickness is about 150nm. It shows that the atomic concentration of carbon and nitrogen decreased continuously, while, oxygen and zirconium increased. XPS shows that coating was including ZrO₂, and Zr-OH, Zr-N, C-H, N-H bonds. The mechanism of hydrogen resistance maybe that hydrogen was seized by carbon, nitrogen and oxygen to form C-H, O-H and N-H bonds while it diffuses from zirconium hydrides.