等离子体循环刻蚀镀膜提高锆膜的水汽阻隔性

Improvement of vapor barrier property of zirconium film by plasma cyclic etching coating

摘要:

为了提高以锆金属镀层封闭聚氨酯泡沫塑料表面对水汽的阻隔性,采用了结合等离子体循环刻蚀和中频磁控溅射镀膜的方法改变锆膜晶粒的生长模式。等离子体循环刻蚀以后,锆膜表面的晶粒呈现出非晶化趋势,无等离子体循环刻蚀时横截面SEM薄膜晶粒的生长方式是法向柱状晶模式,而刻蚀后薄膜呈现的是一种柱状晶和细小球晶团的混合生长模式。最终的水汽阻隔实验表明等离子体循环刻蚀的方法可明显提高锆膜的水汽阻隔性。研究结果表明等离子体循环刻蚀抑制了锆膜的法向柱状晶生长,使晶粒更加细化,膜呈现非晶化趋势,这是膜致密性、水汽阻隔性增加的根本原因。

Abstract:

In order to improve the water vapor barrier property of zirconium film adhered to rigid polyurethane foam plastic, a method of the combination of plasma cycle etching and middle frequency magnetron sputtering technologies is proposed by changing the growth mode of zirconium grains. The grain on the surface of the zirconium film exhibits a trend of non crystallization after plasma cycle etching. A kind of normal columnar crystals is found in the cross sectional morphology for the non-etched sample, but a hybrid of columnar crystal and small groups of spherocrystal is observed for the etched sample. Finally, the water vapor barrier properties of zirconium film can be improved by the ion source cyclic etching. The normal columnar crystal growth of the zirconium film is inhibited by the cyclic etching, making the grain more refined, and the film shows a trend of non crystallization, which is regarded as the fundamental reason for the increase of compactness and improvement of water vapor barrier property.