Al/U固相界面反应的原位高温X射线衍射研究

Interface reaction between aluminium and uranium at high temperature using in-situ X-ray diffraction

摘要:

采用磁控溅射沉积技术在贫铀上镀铝膜，利用X射线衍射原位研究了铝镀层与贫铀基体的界面反应，分析了界面反应产物随温度和时间的变化规律。实验结果显示，镀膜过程Al/U界面没有化合物形成，而在较高温度下（≥335 ℃）两相界面会发生反应并形成金属间化合物UAl₃相，反应动力学符合形核—生长机制。形成的UAl₃相为疏松的层状结构，且相应的衍射峰强度随温度的升高而逐渐降低，直至消失，文中对该现象的原因进行了分析和讨论。

Abstract:

Aluminum film was prepared using magnetron sputtering deposition process on depleted uranium surface. The interface reaction between aluminium and uranium was investigated using in-situ X-ray diffraction at high temperature. The reaction product and the changes with temperature and time were researched and discussed. The experimental results indicate that there are absent any of intermetallic compounds in the original sample, and the interface reaction occurs and the intermetallic compound UAl₃ forms when the temperature is higher than 335 °C. The dynamics of surface reaction is in accord with nucleation-growth mechanism. It is interesting that the diffraction peak’s intensity of UAl₃ decreases with the increasing of temperature and disappear at 600°C, which is analyzed and discussed in this paper.