脉冲偏压占空比对电弧离子镀TiAlN涂层的影响

Influence of Duty Ratio of Pulsed Bias on TiAlN Coatings Deposited by Arc Ion Plating

摘要:

通过优化电弧离子镀工艺参数改善TiAlN涂层结构及性能对TiAlN涂层应用具有重要的实用价值。本文利用脉冲偏压电弧离子镀制备了TiAlN涂层，研究了偏压占空比对TiAlN涂层结构及性能的影响，结果发现：随着占空比增加，涂层表面缺陷密度和表面粗糙度先降低后增大，占空比为70%时，制备的涂层表面缺陷密度和表面粗糙度最低。随着占空比增加，涂层的硬度和耐磨性得到明显改善，但占空比超过50%后继续增加占空比反而降低了涂层的硬度和耐磨性。TiAlN涂层与Si3N4球对磨时的主要磨损机制为黏着磨损和氧化磨损。

Abstract:

Optimization of the process parameters of arc ion plating so as to improve the structure and properties of TiAlN coatings has important practical value in the application of TiAlN coatings. In the work, TiAlN coatings were deposited by pulsed bias arc ion plating, and the influence of duty ratio of pulsed bias on the structure and properites of TiAlN coatings was studied. It was found that the density of surface defects and surface roughness of TiAlN coatings are first decreased and then increased with the increase of the duty ratio; and the density of surface defects and surface roughness is the lowest when the duty ratio is 70%. The micro-hardness and wear resistance of TiAlN coated samples is first improved with the increase of the duty ratio, while the further increase of the duty ratio above 50% has an adverse effect on the micro-hardness and wear resistance. The key wear mechanism of TiAlN coatings includes adhesive wear and oxidation wear when Si₃N₄ ball is used as the friction pair.