沉积温度对高功率脉冲磁控溅射AlCrSiN涂层结构和性能的影响*

Influence of Deposition Temperature on Microstructures and Mechanical Properties of Al-Cr-Si-N Coatings Deposited by HiPIMS Technology

摘要:

高功率脉冲磁控溅射(HiPIMS)技术由于高离化率、高离子能量,可制备表面光滑、结构致密的高质量涂层。而沉积温度能够决定沉积粒子的动能和扩散能力,将对涂层生长过程和性能有着显著影响,本文采用HIPIMS技术在不同沉积温度下制备了Al-Cr-Si-N涂层。系统研究了沉积温度对涂层结构、成分、显微形貌、力学和摩擦学性能的影响。结果表明：随着沉积温度由100°C升至350°C,涂层内部开始由非晶向纳米晶转化,300°C时出现FCC-AlN相；涂层平整性和致密性逐步改善,膜/基结合强度逐渐提高,在300°C达到最大值82 N,但温度继续升高至350°C 时,严重的轰击刻蚀作用使临界载荷骤降至18 N；涂层硬度逐渐增加,在350°C达到最大值19 Gpa；涂层内应力整体呈下降趋势,由-0.8 GPa逐渐降低至-0.4 GPa左右。

Abstract:

High power pulsed magnetron sputtering (HiPIMS) technology can be used to prepare high quality coatings with smooth surface and dense structure due to its high ionization rate and high ion energy. And the deposition temperature will determine the kinetic energy and diffusion ability of the deposited particles, which has a significant impact on the growth process and performance. In this paper, Al-Cr-Si-N coating is prepared by HiPIMS technology at different deposition temperatures. The effects of deposition temperature on the structure, composition, microstructure, mechanical properties and tribological properties of the coatings were systematically studied. The results show that as the deposition temperature rises from 100°C to 350°C, the interior of the coating begins to convert from amorphous to nanocrystals, and the FCC-AlN phase appears at 300°C. The smoothness and compactness of the coatings are progressively improved. The adhesion strength increase gradually, reached the maximum value of 83N at 300 °C and decreases to 18N at 350 °C due to the serious glow etching effect .The hardness of the coating increases gradually and reaches a maximum of 19 GPa at 350°C. No columnar crystals are found and the residual stress is low, and the inverse Hallpez effect occurs, due to the increase in kinetic energy of the deposited particles and the densification of the structure.