铈钨电极的热处理工艺对发射性能的影响

Effect of Heat Treatment Process of Cerium Tungsten Electrode on Emission Mechanism

摘要:

采用真空高温和真空高频两种热处理工艺对铈钨电极进行热处理,利用金相显微镜、电子探针显微分析仪(EPMA)和 X-射线光电子能谱(XPS)等测试分析方法对热处理前后的铈钨电极表面金相形貌和铈元素的浓度-深度分布及价态演变进行研究,以此分析了电极中铈元素的扩散和富集的行为机理,阐明了铈钨电极热处理工艺对其制灯后发射性能的影响。

Abstract:

Two different heat treatment processes, vacuum high temperature and vacuum high frequency, are used to pre-treat cerium-tungsten electrodes for high-power pulsed xenon lamps. The metallographic morphology and the concentration-depth distribution and the evolution of valence state of cerium element of the cerium-tungsten electrodes were studied by some analysis and testing methods, like metallographic microscope, Electron probe micro-analyzer(EPMA) and X-ray photoelectron spectroscopy (XPS). The concentration-depth distribution of the elements was studied to analyze the behavior mechanism of the diffusion and enrichment of the cerium element in the electrode sample, and the effect of the heat treatment process of the cerium-tungsten electrode on the emission performance after lamp manufacture was clarified.