ITO/PET衬底上掠射角溅射沉积WO3薄膜及其电致变色性能

Electrochromic Properties of WO3 Thin Films Deposited on ITO/PET Substrates by Glancing Magnetron Sputtering

摘要:

采用直流磁控反应溅射法，以不同掠射角度在ITO/PET衬底上沉积WO3薄膜。利用场发射扫描电子显微镜（FE-SEM）和能谱仪（EDS）对WO3薄膜表面和断面的形貌及化学组成进行表征；利用电化学工作站和紫外分光光度计对WO3薄膜的电化学性能和光学性能进行分析。结果表明，当掠射角60时，薄膜表面形成类似于山峰状形貌，断面为纳米斜柱状结构，该结构有利于离子和电子的迁移。当掠射角=80时，沉积的WO3薄膜具有最快离子扩散速率和最大光调制幅度，着色效率达到27.05cm2/C。同时，薄膜还表现出快速响应和良好循环稳定性。

Abstract:

WO3 thin films were deposited on ITO/PET substrates by DC magnetron reactive sputtering at different glancing angles. The surface and cross-section morphology as well as chemical composition of WO3 thin film were characterized by field emission scanning electron microscope (FE-SEM) and energy dispersive spectrometer (EDS); Electrochemical and optical performances were measured by electrochemical workstation and ultraviolet spectrophotometer. The results show that the film surface forms a mountain-like morphology as the glancing angle 60, and the cross-section presents slant nano-columnar structure, which is benefit to the migration of ions and electrons. As the glancing angle =80, WO3 thin film has the fastest ion diffusion rate and the largest light modulation amplitude. The colorization efficiency reaches to 27.05cm2/C. Furthermore, the film also shows fast response and good cycle stability.