Ta表面氧含量的调控及Pd/Ta复合膜的制备研究

Regulation of oxygen content on Tantalum surfaces and fabrication of Pd/Ta composite membrane

摘要:

以Ta箔为研究对象,分别采用机械抛光和化学抛光的方法进行了Ta表面氧含量的调控研究,研究结果表明,机械抛光目前较难获得相对“洁净”的Ta表面,需结合氩离子溅射才可以获得氧含量很低的Ta膜；化学抛光能获得相对“洁净”的Ta表面。Ta箔表面经化学抛光处理后,进行Pd/Ta复合膜的化学镀制备研究。通过控制化学镀的时间,在Ta箔表面获得了完整均匀且无孔洞的Pd膜,该Pd膜的厚度约2.8μm。

Abstract:

In this paper, the regulation of oxygen content on the surface of tantalum foil was studied by mechanical polishing and chemical polishing. The results show that it is difficult to obtain relatively clean tantalum surface by mechanical polishing, and tantalum film with low oxygen content can be obtained by argon ion sputtering. Chemical polishing can obtain a relatively clean tantalum surface. The Pd/Ta composite membrane was prepared by electroless plating on the surface of tantalum foil after chemical polishing. In the experiment, by controlling the electroless plating time, a complete and uniform palladium membrane without holes was obtained on the surface of tantalum foil, and the thickness of the palladium film is about 2.8μm.