HTMS改性SiO2减反膜的制备和耐环境稳定性研究

Sol-Gel preparation of HTMS-silica antireflective coatings with high enviroment-resistance

摘要:

本文将正硅酸乙酯（TEOS）做前驱体, 氨水（NH3?H2O）做催化剂制备碱性SiO2溶胶，通过十六烷基三甲氧基硅烷（HTMS）修饰SiO2颗粒来 “钝化”SiO2颗粒，最终获得HTMS改性SiO2溶胶。然后采用提拉法在BK7玻璃表面制备HTMS改性氧化硅薄膜。利用傅里叶变换红外光谱仪（FTIR）、UV-Vis-NIR分光光度计、Film Wizard膜系设计软件和扫描电子显微镜（SEM）等表征方法对薄膜表面结构、光学性能、耐环境稳定性做了研究。结果表明：经过HTMS改性后的薄膜有高透过率和优异的耐环境稳定性，其透过率在峰值可达～99.8%，在90%RH湿度环境下经过两个月时间后，薄膜的峰值透过率仅仅下降了0.3%，改性后其耐环境稳定性得到较大提高。

Abstract:

The monodisperse collodial SiO2 sol was prepared by sol-gel process using tetraethylorthosilicate (TEOS) as precursor and ammonia as catalyst. Hexadecyltrimethoxysilane (HTMS), as a modifier, was added into the sol to passivate the surface of the silica particle . Silica antireflective (AR) coatings were then prepared from different SiO2 sols by dip-coating method. UV-Vis-NIR spectrometer, Fourier transform infrared spectroscopy, transmission electron microscope, Scanning Electron Microscopeand water contact angle measurement were employed to analyze the optical property, microstructure, surface morphology and environmental stability of the coatings. The results show that the HTMS modified silica AR coating can achieve a high transmittance of ~99.8% and possess excellent environment stability.After been placed in an ambient with relative humidity higher than 90% for 2 months, the peak transmittance of the silica AR coatings modified with HTMS decreased only by 0.3%.