磁控溅射WSx/W/DLC/W多层膜的微观结构及摩擦学性能

Microstructure and tribological behavior of magnetron sputtered WSx/W/DLC/W multilayer films

摘要:

采用磁控溅射技术在硅基底上交替沉积WSx、W以及DLC膜层制备WSx/W/DLC/W多层膜。利用X射线衍射仪、扫描电镜、纳米压痕仪等对多层膜的微观结构和力学性能进行了表征，使用球盘式摩擦磨损试验机测试了多层膜在大气中的摩擦学性能。结果表明：多层膜表面均光滑致密。随着周期中W单层厚度的增加，多层膜中出现α-W、W2C和 β-WC1-x结晶相，多层膜的硬度大幅提高（6 nm时具有极大值17.3 GPa），摩擦因数呈下降趋势，结合力逐渐降低，磨损率先降低后升高。W单层厚度为6 nm的多层膜的耐磨性能最佳，磨损率约为1.4×10-14 m3N-1m-1。

Abstract:

WSx/W/DLC/W multilayer films were prepared by using magnetron sputtering technique and alternate deposition of WSx, W and diamond-like carbon (DLC) layers on silicon substrates. The microstructure, mechanical properties and tribological behaviors in the atmosphere of the films were characterized by X-ray diffractometry, scanning electron microscopy, nano-indenter and ball-on-disk wear tester. The results show that the surface of all the multilayer films is smooth and dense. As the thickness of single W interlayer increases in the modulation period, α-W, W2C, and β-WC1-x crystalline phases are formed in the multilayer films. The hardness of the multilayer films is greatly improved (up to 17.3 GPa at single W interlayer thickness of 6 nm), the friction coefficient shows a downward trend, the adhesion to the substrate is gradually reduced and the wear rate decreases first and then increases. The multilayer film with single W interlayer thickness of 6 nm exhibits the best wear resistance, its wear rate is about 1.4×10-14 m3N-1m-1.