Ion-beam Assisted Magnetron Sputtering Deposition of Titanium Nitride Films

Abstract:

Titanium nitride films were deposited by ion beam assisted deposition, magnetron sputtering and ion-beam assisted magnetron sputtering deposition on GCr15 and Si substrate. The structure and mechanical properties such as micro-hardness, bonding strength, wear resistance were studied as well as the corrosion resistance. The results show that the hardness, bonding strength and wear resistance of the titanium nitride films deposited by ion-beam assisted magnetron sputtering are increased greatly and the corrosion resistance of films is also improved.