The Effect of Oxygen Partial Pressure and Annealing on Morphology and Optical Properties of TiO_2 Films Coated on Glass

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The Effect of Oxygen Partial Pressure and Annealing on Morphology and Optical Properties of TiO_2 Films Coated on Glass
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                        Zhao Qingnan,Li Chunling,Zhao XiujianZhao Qingnan,Li Chunling,Zhao Xiujian

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Key words:TiO2 film on glass,nanometer crystal and pore,O2 partial pressure,sputtering,annealing,

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[1]Zhao Qingnan,Li Chunling,Zhao Xiujian.The Effect of Oxygen Partial Pressure and Annealing on Morphology and Optical Properties of TiO_2 Films Coated on Glass[J].Rare Metal Materials and Engineering,2004,33(3):309-312.

[2]Zhao Qingnan,Liu Baoshun,Zhao Xiujian,A.W.Sleight.Effect of the Ratio of Oxygen to Argon and Thermal Treatment on the Structure and Hydrophilicity of TiO2 Thin Films Coated on Glass by DC Reactive Magnetron Sputtering[J].Rare Metal Materials and Engineering,2003,32(5):339-343.

[3]YANG Bing-chu,LIU Xiao-yan,GAO Fei.Effect of Oxygen Partial Pressure on the Structure and Optical Properties of ZnO Thin Films[J].Semiconductor Technology,2007,32(6):494-496,504.

[4]Yan Youhu,Liu Yingchun,Fang Ling,Lu Zhichao,Zhou Shaoxiong and Li Zhengbang.Effect of Sulfur Partial Pressure on Properties of CuInS2 Absorber Films[J].Rare Metal Materials and Engineering,2009,38(5):838-841.

[5]PENG Jie,LI Zi-quan,LIU Jing-song,JIANG Ming,XU Qi.Effect of Annealing Temperature on Structure and Optical Properties of Ge/SiO2 Multilayer Films[J].Journal of Materials Engineering,2014(9):32-38.

[6]LIU Ming,WEI Wei,Qu Sheng-Wei,GU Jian-Feng,MA Chun-Yu,ZHANG Qing-Yu.Effect of Oxygen Pressure on the Growth Behavior and Optical Properties of ZnO Films[J].Journal of Inorganic Materials,2008,23(6):1096-1100.

[7]阮鑫栋,姜妍彦,杜兴科,刘贵山,胡志强,刘敬肖.Effect of Annealing on Microstructure and Properties of ZnO Thin Films Deposited on Glass Surface[J].Journal of The Chinese Ceramic Society,2013,41(6).

[8]MENG Fan-ming,CAO Chun-bin,SUN Zhao-qi.Influence of Annealing Time on the Optical Properties of TiO2 Thin Films[J].Piezoelectrics & Acoustooptics,2008,30(5).

[9]YANG Bing-chu,GAO Fei,LIU Xiao-yan.Effect of Annealing in N2 on Structure and Optical Properties of ZnO Thin Films[J].Semiconductor Optoelectronics,2007,28(3):375-378.

[10]Huang Daiyong,Gong Yueqiu,Liu Baoshun,Zhao Qingnan,Zhao Xiujian,Postgraduate,State of Key Laboratory for Advanced Technology of Materials Synthesis and Processing,WUT,Wuhan ,China..The Effect of Annealing Temperature on the Structure and Properties of Titanium Oxide Films[J].Journal of Wuhan University of Technology,2002,24(6):1-3.

[11]弥谦,李刘晨,惠迎雪,徐均琪.Effect of Oxygen Partial Pressure on Optical Properties and Morphology of Arc Ion Plating Prepared TiO2 Optical Thin Film[J].Journal of Xi'an Institute of Technology,2012(6):451-454,487.

[12]DU Zhi,LI He-qin,NIE Zhu-hua,CHU Han-qi,ZHU Jing-chao.Effect of Annealing Temperatures on Structures and Optical Properties of RF Magnetron Sputtering SiC Films[J].Physical Testing and Chemical Analysis Part A:Physical Testing,2010(12):753-756.

[13]Dmitriy A.Golsoy,Sergey M.Zavatskiy,ZHU Chang,LIU Jia,Dmitriy A.Golsoy,Sergey M.Zavatskiy.Influence of Oxygen Pressure on the Optical Properties of TiO2 Films Deposited with IBS Ion-assisted Technique[J].Journal of Xi'an Institute of Technology,2008,28(6).

[14]Ba Dechun,Chang Xuesen,Wen Lishi,Liu Kun.Oxygen Pressure and Hydrophilicity of TiO2 Films Grown by Reactive Magnetron Sputtering[J].JOurnal of Vacuum Science and Technology,2007,27(2):155-158.

[15]LIU Wei,SU Xiao-ping,ZHANG Shu-yu,HAO Peng,WANG Hong-bin,LIU Jia-he,YAN Lan-qin.Effect of Oxygen Partial Pressure on the Structure and Optical Properties of HfOxNy Thin Films[J].Laser & Infrared,2007,37(12):1307-1310.

[16]YAN Ningning,WANG Hong,LIU Jing,ZUO Yan.Influence of Oxygen Partial Pressure on Properties of ZnO:Al Thin Films Fabricated at Room Temperature[J].Journal of The Chinese Ceramic Society,2013(9):1251-1257.

[17]Li Qiang,Yang Ruixia,Pan Guofeng,Wang Ru,Wei Wei.Effect of Pressure and Annealing Temperature on Structure of SiC Thin Films[J].Micronanoelectronic Technology,2009,46(5).

[18]唐晓红,黄美东,杜姗,刘春伟,高倩,王小龙,张建鹏,杨明敏.Influence of Oxygen Partial Pressure on Structure and Optical Transmittance of Sputtered Vanadium Oxide Films[J].Laser & Optoelectronics Progress,2014,51(6):63101-203.

[19]LI Yongnan,XIANG Chao,YIN Bo,PAN Dong,TANG Meng and ZHONG Chuanjie.Effect of High Pressure Annealing Atmosphere on the Optical Properties of a-IGZO Thin Films Prepared by Solution Process[J].Microelectronics,2018,48(5):690-694.

[20]Xue Hua,Zhang Guoheng,Zhang Hao.Influence of Oxygen Partial Pressure on the Photoluminescence Properties of Nano ZnO Films[J].Semiconductor Technology,2009,34(2).

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[Zhao Qingnan, Li Chunling, Zhao Xiujian. The Effect of Oxygen Partial Pressure and Annealing on Morphology and Optical Properties of TiO_2 Films Coated on Glass[J]. Rare Metal Materials and Engineering,2004,33(3):309~312.]
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