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Electrochemical Corrosion of Ti-Si-N Films Coated by Pulsed-DC Plasma Enhanced CVD
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TG146.4

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[Ma Dayan, Wang Xin, Ma Shengli, Xu Kewei. Electrochemical Corrosion of Ti-Si-N Films Coated by Pulsed-DC Plasma Enhanced CVD[J]. Rare Metal Materials and Engineering,2004,33(7):740~743.]
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  • Revised:December 24,2002
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