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Microstructure Comparison between Co-Sputtered and Multilayer-Sputtered FePt:Ag Granular Thin Films
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TB43

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    Abstract:

    Two different sputtering modes, co-sputtering and multilayer-sputtering, were used to fabricate FePt:Ag granular thin films. It is observed by the MFM and TEM images that smaller magnetic domain patterns and grains are more uniformly distributed in the co-sputtered granular films compared to in multilayer-sputtered ones. This difference in the microstructure is explained to be attributed to the more randomly distributed Ag atoms in the co-sputtered films. Further study on in-depth defects in these films confirms this explanation.

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[Cheng Xiaomin, Li Zuoyi, Wang Jianping. Microstructure Comparison between Co-Sputtered and Multilayer-Sputtered FePt:Ag Granular Thin Films[J]. Rare Metal Materials and Engineering,2005,34(12):1879~1881.]
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  • Received:March 29,2004
  • Revised:September 21,2004
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