Cheng Xinhong
University of Wenzhou, Wenzhou 325027, ChinaHe Dawei
Shanghai Institute of Microsystem & Information Technology, Chinese Academy of Sciences, Shanghai 200050, ChinaSong Zhaorui
Shanghai Institute of Microsystem & Information Technology, Chinese Academy of Sciences, Shanghai 200051, ChinaYu Yuehui
Shanghai Institute of Microsystem & Information Technology, Chinese Academy of Sciences, Shanghai 200052, ChinaShen Dashen
University of Alabama in Huntsville,Huntsville, Alabama 35899Supported by National Natural Science Foundation of China (50402026)
[Cheng Xinhong, He Dawei, Song Zhaorui, Yu Yuehui, Shen Dashen. Interfacial and Electrical Characterization of HfO2 Gate Dielectric Film with a Blocking Layer of Al2O3[J]. Rare Metal Materials and Engineering,2009,38(2):189~192.]
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