A Novel Chemical Solution Deposition Approach for Preparation of RE2O3 (RE=Y, Sm, Eu, Dy, Yb) Buffer Layer Used for Coated Conductors

Abstract:

A novel chemical solution deposition approach was employed for the preparation of coated-conductor-used RE2O3 (RE=Y, Sm, Eu, Dy, Yb) buffer layers on the biaxial NiW(200) alloy substrate. X-ray diffraction (XRD), scanning electron microscope (SEM), and atomic force microscope (AFM) were used to characterize the phase structure, texture, surface morphology and roughness of the as-received RE2O3 buffer layers. Results show that the obtained RE2O3 buffer layers have well biaxial texture and their surface is smooth and crack free.