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Influence of positive-Ohm and anti-Ohm sections of gas discharge volt-ampere characteristic on microstructure and properties
Affiliation:

Xi'an University of Technology

Clc Number:

TB43

Fund Project:

The Natural Science Foundation of Jiangsu Province of China (BK2009104); The Innovation Program of Graduated Student of Jiangsu Province (CXZZ12-731, CXLX11-0388)

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    Abstract:

    The volt-ampere characteristics of gas discharge was introduced form positive-Ohm of magnetron sputtering ion plating into anti-Ohm section using pulse mode and deposited TiN films under different target current density. The influences of positive-Ohm and anti-Ohm sections on the microstructure and properties of the films were studied. The results indicated that in the anti-Ohm section with target current density (Itd) is more than 0.2A?cm-2, the films have good surface quality and density degree, and the hardness and membrane-binding strength were upgraded from 18.9GPa、4.5N in positive-Ohm section (Itd=0.11A?cm-2) to 25.8GPa、18N in anti-Ohm section (Itd=0.38 A?cm-2) respectively.

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[haojuan. Influence of positive-Ohm and anti-Ohm sections of gas discharge volt-ampere characteristic on microstructure and properties[J]. Rare Metal Materials and Engineering,2016,45(9):2439~2443.]
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History
  • Received:July 27,2014
  • Revised:September 17,2014
  • Adopted:November 20,2014
  • Online: October 09,2016