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Influence of DC bias voltage on Structure and Performance of theAl-Cr-Si-N Coatings Prepared by Arc Ion Plating Techniques
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Tianjin Key Laboratory of High Speed Cutting and Precision Manufacturing,Tianjin University of Technology and Education,Tianjin,Tianjin Key Laboratory of High Speed Cutting and Precision Manufacturing,Tianjin University of Technology and Education,Tianjin,Tianjin Key Laboratory of High Speed Cutting and Precision Manufacturing,Tianjin University of Technology and Education,Tianjin,Tianjin Key Laboratory of High Speed Cutting and Precision Manufacturing,Tianjin University of Technology and Education,Tianjin,Surface Engineering of Materials Division,Institute of Metal Research,Chinese Academy of Sciences,Shenyang,Tianjin Key Laboratory of High Speed Cutting and Precision Manufacturing,Tianjin University of Technology and Education,Tianjin

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    Abstract:

    Al-Cr-Si-N coatings were deposited by arc ion plating (AIP) technique at various DC bias voltages. The effects of bias voltage on the microstructure, mechanical and wear properties of the Al-Cr-Si-N coatings were investigated. The results show that the Al-Cr-Si-N coatings is mainly composed of the hexagonal structure and the face-centered cubic structure of AlN phase. with the increase of substrate bias, the diffraction peak of the coating is shifted to the small angle. Compressive stress gradually increased, the maximum value of -0.77GPa; coating hardness and friction coefficient change is not obvious. When the negative bias of the substrate is -40V, the characteristic parameters H/E and H3/E* 2 of Al-Cr-Si-N coating are the maximum, which are 0.1475 and 0.3681GPa, respectively. At the same time, the coating had the best wear resistance and the friction coefficient was the lowest.

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[ZHANG Jiaojiao, WANG Tiegang, YAN Bing, LIU Yuan, JIANG Sumeng, DONG Yu. Influence of DC bias voltage on Structure and Performance of theAl-Cr-Si-N Coatings Prepared by Arc Ion Plating Techniques[J]. Rare Metal Materials and Engineering,2018,47(7):2232~2239.]
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History
  • Received:October 10,2017
  • Revised:November 18,2017
  • Adopted:December 13,2017
  • Online: October 10,2018
  • Published: