Structure and mechanical properties of multi-element (CrMoTaNbVTi)N films by reactive magnetron sputtering

Abstract:

In this study, (CrMoTaNbVTi)N multi-element films are deposited by direct current magnetron sputtering CrMoTaNbV mosaic alloy target and pure Ti target. The composition, structure, mechanical properties and wear behavior of the films deposited at RN (N2/(Ar+N2)=0%, 10%, 20%, 30% and 40% are investigated. The (CrMoTaNbVTi)N films deposited at RN=0% and 10 % exhibit a simple BCC solid solution structure, whereas those deposited at RN=20%, 30 % and 40% show a simple FCC solid solution structure. With increasing of RN, the size of the surface particles is decreased and the columnar crystals are become denser. Meanwhile, the compressive stress, adhesive critical load (Lc), hardness and elastic modules are increased and reach a maximum value of -3.3 GPa, 352 mN, 25.6±1.2 GPa and 278.8±11.2 GPa at RN=40%, respectively. The wear rate of film deposited at RN =40% is decreased about ten times that the alloy film (RN=0%), indicated an excellent wear resistance.

Key words:multi-element nitride film; structure; mechanical property; wear