Zheng Wei
Institute of Semiconductors, Guangdong Academy of Sciences, Guangzhou 510650, ChinaWang Yao
Institute of Semiconductors, Guangdong Academy of Sciences, Guangzhou 510650, ChinaHe Siliang
School of Mechanical and Electrical Engineering, Guilin University of Electronic Technology, Guilin 541004, ChinaXiang Xun
Institute of Semiconductors, Guangdong Academy of Sciences, Guangzhou 510650, ChinaCui Yinhua
Institute of Semiconductors, Guangdong Academy of Sciences, Guangzhou 510650, ChinaHu Chuan
Institute of Semiconductors, Guangdong Academy of Sciences, Guangzhou 510650, China1.Institute of Semiconductors, Guangdong Academy of Sciences, Guangzhou 510650, China;2.School of Mechanical and Electrical Engineering, Guilin University of Electronic Technology, Guilin 541004, China
Key-Area Research and Development Program of Guangdong Province (2020B0101320001); Project of Special Fund for Action to Build the First-Class Domestic Research Institution of Guangdong Academy of Sciences (2021GDASYL-20210103080, 2021GDASYL-20210103078); Science and Technology Program Project of Guangzhou (202102020404)
[Zheng Wei, Wang Yao, He Siliang, Xiang Xun, Cui Yinhua, Hu Chuan. Effect of Substrate Type on Morphology of Silica Aerogel Film Prepared by Ambient Pressure Dry Method[J]. Rare Metal Materials and Engineering,2023,52(2):493~501.]
DOI:10.12442/j. issn.1002-185X.20220442