1.Institute of Semiconductors, Guangdong Academy of Sciences, Guangzhou 510650, China;2.School of Mechanical and Electrical Engineering, Guilin University of Electronic Technology, Guilin 541004, China
Key-Area Research and Development Program of Guangdong Province (2020B0101320001); Project of Special Fund for Action to Build the First-Class Domestic Research Institution of Guangdong Academy of Sciences (2021GDASYL-20210103080, 2021GDASYL-20210103078); Science and Technology Program Project of Guangzhou (202102020404)
[Zheng Wei, Wang Yao, He Siliang, Xiang Xun, Cui Yinhua, Hu Chuan. Effect of Substrate Type on Morphology of Silica Aerogel Film Prepared by Ambient Pressure Dry Method[J]. Rare Metal Materials and Engineering,2023,52(2):493~501.]
DOI:10.12442/j. issn.1002-185X.20220442