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High Temperature Oxidation Behavior and Failure Mechanisms of Silicide Diffusion Coating Deposited on TC4 Alloy
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Affiliation:

1.College of Mechanical Engineering,Sichuan University of Science and Engineering;2.China United Northwest Institute for Engineering Design and Research Corporation,Xi’an

Clc Number:

TG174

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    Abstract:

    Silicon diffusion coating has been prepared on TC4 alloy by pack cementation technique to improve its high temperature oxidation resistance. The microstructure, high temperature oxidation behavior and failure mechanisms of the coating were studied. The results show that the coating has a dense multilayer structure, mainly consisted of a TiSi2 outer layer, a TiSi middle layer, and a Ti5Si4+Ti5Si3 inner layer. The high temperature oxidation tests show that a protective scale composed of SiO2 and TiO2 formed on the surface of the coating during oxidizing at 850 ℃ in air, imposed to relatively good anti-high temperature oxidation property of the coating. The inter-diffusion of Ti and Si between the coating and the substrate caused the increase of TiO2 in the scale and lacking of Si source, resulting in the degeneration of the protective scale. The high P-B ratio between the oxides and the coating, together with the mismatch of the thermal expansion coefficients among the oxides and the coating should be the main factors responsible for cracking and spallasion of the scale.

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[Hunag Bo, Li Xuan, Xie Xiaoqing, Lai Sheng, Tian Jin, Tian Wei, Liu Zhongbin. High Temperature Oxidation Behavior and Failure Mechanisms of Silicide Diffusion Coating Deposited on TC4 Alloy[J]. Rare Metal Materials and Engineering,2021,50(2):544~551.]
DOI:10.12442/j. issn.1002-185X.20200377

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History
  • Received:June 01,2020
  • Revised:August 18,2020
  • Adopted:August 28,2020
  • Online: March 09,2021
  • Published: