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Ti掺杂量对碳基镀层沉积行为及导电耐蚀性的影响
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西安理工大学 材料科学与工程学院,陕西 西安 710048

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TG174.444;TM911.4

基金项目:

国家自然科学基金青年基金(52001251);陕西省自然科学基金青年基金(2022JQ-556)


Effect of Ti Doping Amount on Deposition Behavior, Electrical Conductivity and Corrosion Resistance of Carbon-Based Coatings
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School of Materials Science and Engineering, Xi'an University of Technology, Xi'an 710048, China

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    摘要:

    本研究通过向非晶碳基镀层中适量掺杂金属Ti纳米晶,以达到提升镀层导电性和耐蚀性的目的。实验采用磁控溅射系统和自研的高频振荡脉冲电场制备多组含有不同Ti掺杂量的碳基镀层,研究Ti纳米晶的添加对非晶碳基镀层导电性与耐蚀性的影响规律。实验结果表明:随着Ti靶电流由0.35 A增加至0.7 A时,镀层中Ti的掺杂量随之提高,Ti原子分数可达8.20%,碳基镀层由非晶结构转变为Ti纳米晶/非晶碳基复合结构。另一方面,实验结果证实Ti的适量掺杂有利于镀层致密性、导电性、疏水性及耐腐蚀性的提升。当Ti靶电流为0.7 A时,镀层方阻值最低,为4.5 Ω/□,Ti靶电流为0.9 A时,镀层的水接触角最大为97.75°,腐蚀电流密度最小为1.408×10-5 A·cm-2

    Abstract:

    The electrical conductivity and corrosion resistance of the amorphous carbon-based coating were improved by doping an appropriate amount of Ti nanocrystals. The magnetron sputtering system and the self-developed high-frequency oscillating pulsed electric field were used to prepare several groups of carbon-based coatings with different Ti doping amounts. The effect of Ti nanocrystal addition on the electrical conductivity and corrosion resistance of amorphous carbon-based coatings was studied. The results show that with increasing the Ti target current from 0.35 A to 0.7 A, the Ti doping amount in the coating is increased with the Ti content reaching 8.20at%, and the carbon-based coating changes from amorphous structure to Ti nanocrystalline/amorphous carbon composite structure. In addition, appropriate doping of Ti is beneficial to improve the density, electrical conductivity, hydrophobicity and corrosion resistance of the coating. When the Ti target current is set as 0.7 A, the sheet resistance of the coating reaches its minimum value of 4.5 Ω/□. When the Ti target current is increased to 0.9 A, the water contact angle of the coating achieves its maximum value of 97.75°, while the corrosion current density decreases to its minimum value of 1.408×10-5 A·cm-2.

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王岚,杨超,蒋百灵,孙添钰,李嘉桐,董丹,郝娟.Ti掺杂量对碳基镀层沉积行为及导电耐蚀性的影响[J].稀有金属材料与工程,2025,54(9):2377~2383.[Wang Lan, Yang Chao, Jiang Bailing, Sun Tianyu, Li Jiatong, Dong Dan, Hao Juan. Effect of Ti Doping Amount on Deposition Behavior, Electrical Conductivity and Corrosion Resistance of Carbon-Based Coatings[J]. Rare Metal Materials and Engineering,2025,54(9):2377~2383.]
DOI:10.12442/j. issn.1002-185X.20240242

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  • 收稿日期:2024-04-24
  • 最后修改日期:2024-07-04
  • 录用日期:2024-07-10
  • 在线发布日期: 2025-08-15
  • 出版日期: 2025-07-31