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电流密度和铜离子浓度对电沉积Cu-Ni镀层性能的影响
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1.哈尔滨工程大学 烟台研究院,山东 烟台 264006;2.枣庄学院 化学化工与材料科学学院,山东 枣庄 277160;3.哈尔滨工程大学 超轻材料与表面技术教育部重点实验室,黑龙江 哈尔滨 150001

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基金项目:

the Key R&D Program of Shandong Province, China (2023SFGC0101), the National Natural Science Foundation of China (NSFC:51971071, NSFC:52075112 and NSFC:52261135538) and Fundamental Research Projects of Science & Technology Innovation and development Plan in Yantai City (No.2022JCYJ023).


Influence of Current Density and Copper Ion Concentration on Properties of Electrodeposited Cu-Ni Coatings
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Affiliation:

1.Yantai Research Institute, Harbin Engineering University, Yantai 264006, China;2.Chemical Engineering and Materials Science, Zaozhuang University, Zaozhuang 277160, China;3.Key Laboratory of Superlight Materials and Surface Technology, Harbin Engineering University, Harbin 150001, China

Fund Project:

Key R&D Program of Shandong Province, China (2023SFGC0101); National Natural Science Foundation of China (51971071, 52075112, 52261135538); Fundamental Research Projects of Science & Technology Innovation and Development Plan in Yantai City (2022JCYJ023)

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    摘要:

    研究了一种简单、高效、环保的防腐技术,通过在工件表面沉积Cu-Ni合金涂层来阻止腐蚀介质,从而保护碳钢表面免受腐蚀。使用扫描电子显微镜、X射线能量色散光谱、维氏硬度计、摩擦磨损试验机和电化学测试研究了电流密度和Cu2+浓度对涂层成分、形态和组成的影响。结果表明,涂层表面出现花椰菜状富镍突起结构。较低的电流密度和Cu2+浓度通过影响晶粒微观结构和Cu/Ni含量来影响涂层的维氏硬度和耐磨性,从而导致硬度和耐磨性能的降低。当电流密度为10 mA·cm–2,Cu2+浓度为0.1 mol·L–1时,沉积样品的腐蚀电流密度达到1.389×10-5 A·cm–2。经过24 h的盐雾试验后,镀层表面腐蚀损伤明显小于未覆盖镀层样品。对沉积机理的研究表明,Cu2+在扩散控制下经历瞬时形核,倾向于垂直生长并形成花椰菜状突起,而Ni2+则受电化学控制,在表面均匀放电。

    Abstract:

    A straightforward, highly effective, and environmentally friendly technique was investigated for protecting carbon steel surfaces from corrosion, i. e., depositing Cu-Ni alloy coatings on the workpiece's surface to impede corrosive medium. The effects of current density and copper ion concentration (Cu2+) on the composition, morphology, and properties of the coating were analyzed using scanning electron microscope, X-ray energy dispersive spectrometer, Vickers hardness tester, friction and wear tester, and electrochemical testing. Results show that a cauliflower-like Ni-rich protrusion structure appears on the coating surface. The lower current density and Cu2+ concentration affect the Vickers hardness and wear resistance of the coating by altering the microstructure and Cu/Ni content, both leading to a decrease in hardness and wear resistance. When the current density is 10 mA·cm-2 and the Cu2+ concentration is 0.1 mol·L-1, the corrosion current density of the deposited sample reaches 1.389×10-5 A·cm-2, and its surface corrosion damage is reduced compared to the uncoated sample after 24 h of salt spray test. Research on the deposition mechanism indicates that Cu2+ undergoes instantaneous nucleation under diffusion control, tending to grow vertically and form cauliflower-like protrusions, while Ni2+ is discharged uniformly across the surface under electrochemical control.

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郭叙言,熊壮壮,王桂香,周强,武艳雄,孔德龙,马福秋,巫瑞智.电流密度和铜离子浓度对电沉积Cu-Ni镀层性能的影响[J].稀有金属材料与工程,2025,54(9):2231~2240.[Guo Xuyan, Xiong Zhuangzhuang, Wang Guixiang, Zhou Qiang, Wu Yanxiong, Kong Delong, Ma Fuqiu, Wu Ruizhi. Influence of Current Density and Copper Ion Concentration on Properties of Electrodeposited Cu-Ni Coatings[J]. Rare Metal Materials and Engineering,2025,54(9):2231~2240.]
DOI:10.12442/j. issn.1002-185X.20240460

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  • 收稿日期:2024-07-26
  • 最后修改日期:2025-06-25
  • 录用日期:2024-09-09
  • 在线发布日期: 2025-08-15
  • 出版日期: 2025-07-31