脉冲偏压幅值对TiZrN/TiN纳米多层膜微观结构和性能的影响

Effects of Pulsed Bias Voltage on Microstructure and Properties of TiZrN/TiN Nano-Multilayer Films

摘要:

采用电弧离子镀技术和高功率脉冲磁控溅射复合方法，在M2高速钢和单晶硅片上沉积TiZrN/TiN纳米多层膜。研究脉冲偏压幅值对TiZrN/TiN纳米多层膜微观结构、元素成分、相结构、膜基结合力、纳米硬度、摩擦磨损性能和耐腐蚀性能的影响规律。研究发现，随着脉冲偏压幅值的增加，在脉冲偏压幅值为–500 V时薄膜粗糙度减小到0.345 μm，薄膜厚度呈波动变化的趋势，TiZrN/TiN纳米多层膜的择优取向从(111)晶面转变为(220)晶面。当脉冲偏压幅值为–200 V时，TiZrN/TiN纳米多层膜与基体的结合力等级为HF2；薄膜的纳米硬度和弹性模量分别增加到47.02 GPa和382.28 GPa，硬度是高速钢基体（~9 GPa）的5.2倍；摩擦磨损测试结果表明，此时薄膜的耐磨损性能较好，磨损率降低到4.38×10^-8 mm³·N^-1·m^-1；同时电化学腐蚀测试发现TiZrN/TiN纳米多层膜的自腐蚀电流密度降到最低0.566 μA/cm²，约为高速钢基体（9.654 μA/cm²）的 1/17，薄膜腐蚀速率最慢。采用电弧离子镀和高功率脉冲磁控溅射复合方法，可以减小薄膜表面粗糙度；通过调控脉冲偏压幅值，改变离子能量，TiZrN/TiN纳米多层膜的硬度、耐磨损和耐腐蚀性能相较于高速钢基体有显著提升。

Abstract:

TiZrN/TiN nano-multilayer films were deposited by hybrid method of arc ion plating and high-power impulse magnetron sputtering techniques on M2 high-speed steel and single crystal silicon substrates. The microstructure, element composition, phase structure, adhesion strength between the film and substrate, nanohardness, friction and wear properties and corrosion resistance of TiZrN/TiN nano-multilayer films were investigated. Results show that with the increase in pulsed bias voltage, the surface roughness of TiZrN/TiN nano-multilayer films is decreased to 0.345 μm when the pulsed bias voltage is –500 V, and the thickness of the films exhibits a fluctuant trend. The preferred orientation of TiZrN/TiN nano-multilayer films shifts from (111) crystal plane to (220) crystal plane. At a pulsed bias voltage of –200 V, the adhesion strength level between TiZrN/TiN nano-multilayer films and substrate reaches to HF2. The nanohardness and elastic modulus of the TiZrN/TiN nano-multilayer film are increased to 47.02 GPa and 382.28 GPa, respectively. The hardness is 5.2 times higher than that of M2 high-speed steel substrate (about 9 GPa). At the pulsed bias voltage of –200 V, the wear rate reaches 4.38×10^-8 mm³·N^-1·mm^-1, which indicates that the TiZrN/TiN nano-multilayer films have good wear resistance. The electrochemical corrosion test shows that the self-corrosion current density of TiZrN/TiN nano-multilayer films reaches the minimum value of 0.566 μA/cm², which is approximately 1/17 of that of the high-speed substrate (9.654 μA/cm²), and the film exhibits the slowest corrosion rate. Using the hybrid method of arc ion plating and high-power impulse magnetron sputtering can reduce the surface roughness of TiZrN/TiN nano-multilayer films. With the increase in pulsed bias voltage, the ion energy can be changed, which significantly enhances the hardness, wear resistance, and corrosion resistance of TiZrN/TiN nano-multilayer films compared with those of the M2 high-speed steel substrate.